- Title
- Scanning probe force microscopy of III-V semiconductor structures
- Creator
- Kameni Boumenou, Christian
- Subject
- Scanning probe microscopy -- South Africa Semiconductors -- Optical properties
- Date Issued
- 2017
- Date
- 2017
- Type
- Thesis
- Type
- Masters
- Type
- MSc
- Identifier
- http://hdl.handle.net/10948/13992
- Identifier
- vital:27380
- Description
- In this dissertation, cross-sectional potential imaging of GaAs-based homoepitaxial, heteroepitaxial and quantum well structures, all grown by atmospheric pressure Metal-organic Vapor Phase Epitaxy (MOVPE) is investigated. Kelvin probe force microscopy (KPFM), using amplitude modulation (AM) and frequency modulation (FM) modes in air and at room temperature, is used for the potential imaging. Studies performed on n-type GaAs homoepitaxial structures have shown two different potential profiles, related to the difference in electron density between the semi-insulating (SI) substrate and the epilayers. It is shown that the contact potential difference (CPD) between the tip and sample is higher on the semi-insulating substrate side than on the n-type epilayer side. This change in CPD across the interface has been explained by means of energy band diagrams indicating the relative Fermi level positions. In addition, it has also been found that the CPD across the interface increases with electron density. This result is in qualitative agreement with theory. In addition, as known from literature, even under ambient conditions FM mode KPFM provides better lateral resolution and more realistic CPD values than AM mode KPFM. Compared to the case of AM mode analysis, where the experimental CPD values were on average of the theoretical values, the CPD values from FM mode analysis are on average of the theoretical ones. Furthermore, by using FM mode, the transition across the interface is sharper and the surface potential flattens/saturates as expected when scanning sufficiently far away from the junction. The non-neutral space charge region of the sample with an electron density of for example, is as measured by FM-KPFM, whereas for AM-KPFM, the width is even more than and the potential profiles do not saturate. For the p-type GaAs homoepitaxial structures, FM mode measurements from a sample with a dopant density of are presented. As in the case of n-type GaAs,a similar potential profile showing two main domains has been obtained. However, unlike the case of type GaAs where the potential measured on the epilayer side is higher than that on the substrate side, the potential on the epilayer side of the junction is lower in this case due to the fact that the Fermi level of p-type GaAs is below that of the substrate.
- Format
- iv, 77 leaves
- Format
- Publisher
- Nelson Mandela University
- Publisher
- Faculty of Science
- Language
- English
- Rights
- Nelson Mandela University
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